| 发明名称 |
PHOTOSENSITIVE RESIN COMPOSITION |
| 摘要 |
<p>A radiation sensitive resin composition containing an alkali soluble resin and a quinonediazide group-containing photosensitizer, in which the photosensitizer comprises a mixture of two or more esters between tetrahydroxybenzophenone and 1,2-naphthoquinonediazidesulfonic acid having different esterification rates. As the photosensitizer, a mixture of photosensitizer A comprising an esterification product from tetrahydroxybenzophenone and 1,2-naphthoquinonediazide-5-sulfonic acid having an average esterification rate of X% (50 </= X </= 100) and photosensitizer B comprising an esterification product from tetrahydroxybenzophenone and 1,2-naphthoquinonediazide-5-sulfonic acid having an average esterification rate of Y% (25 </= Y </= (X-10)), with the mixing ratio A:B being 10 - 90 : 90 - 10, is preferred.</p> |
| 申请公布号 |
EP1255161(A1) |
申请公布日期 |
2002.11.06 |
| 申请号 |
EP20010974782 |
申请日期 |
2001.10.11 |
| 申请人 |
CLARIANT INTERNATIONAL LTD. |
发明人 |
TAKAHASHI, SHUICHI;IKEMOTO, JUN;SHIODA, HIDEKAZU;KAWATO, SHUNJI |
| 分类号 |
C08K5/07;C08K5/42;C08L101/00;G03F7/022;G03F7/023;H01L21/027;(IPC1-7):G03F7/022 |
主分类号 |
C08K5/07 |
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