发明名称 Base assembly for a stage chamber of a wafer manufacturing system
摘要 A base assembly is provided to support a wafer stage chamber assembly of a wafer manufacturing system. The wafer stage chamber assembly isolates semiconductor substrates from the atmosphere so that the resulted wafers have an improved quality and meet certain wafer manufacturing specifications. The base assembly includes a stage base to support the stage device, a base frame to support the stage base, and a plurality of support members to attach the base frame to an apparatus frame of the semiconductor substrate manufacturing apparatus. The base assembly also includes at least one mover base positioned adjacent the stage base to support at least one mover assembly. In addition, the base assembly is provided with an accessory channel to store accessories, such as cables, hoses, and wires, away from various moving parts in the wafer stage chamber assembly. The base assembly further includes a front shear panel having at least one loader port to provide access for the semiconductor substrates to go into and out of the wafer stage chamber assembly. On the underside of the stage base, there is a strengthening rib structure having a multi-radial configuration, each radial configuration centering on a pivotal support point for the stage device.
申请公布号 US2002159046(A1) 申请公布日期 2002.10.31
申请号 US20010843076 申请日期 2001.04.27
申请人 NIKON CORPORATION 发明人 BINNARD MICHAEL;HAZELTON ANDREW;KOVALERCHIK MICHAEL
分类号 G03F7/20;(IPC1-7):G03B27/42 主分类号 G03F7/20
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