发明名称 SEMICONDUCTOR RING LASER GYRO AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a simple and high-yield manufacturing method of a semiconductor ring laser gyro wherein the side wall of a ridged optical waveguide is inclined against a substrate and a reflecting mirror is vertical to the substrate. SOLUTION: An etching mask 101 for the semiconductor ring laser gyro is formed as shown in figure (A). In this case, the section shape of an etching mask 102 for the ridged waveguide part is formed to have a shape similar to a hemispheric shape as shown in figure (B), and, on the other hand, an etching mask 104 of the reflecting mirror part is formed to have a rectangular section shape as shown in figure (C). By using the etching mask formed in this way, dry etching is performed in a condition wherein the reflecting mirror part is formed vertically and smoothly as shown in figure (D). The inclined side of the ridged waveguide and the reflecting mirror part vertical to a growing layer can be formed by one-time dry etching in this way.
申请公布号 JP2002318117(A) 申请公布日期 2002.10.31
申请号 JP20010123113 申请日期 2001.04.20
申请人 CANON INC 发明人 NAKANISHI KOICHIRO;NUMAI TAKAAKI
分类号 G01C19/66;G02B6/13;H01L21/302;H01L21/3065;H01S5/10;(IPC1-7):G01C19/66;H01L21/306 主分类号 G01C19/66
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