| 摘要 |
PURPOSE: An apparatus for preventing pollution of a bake plate cover in semiconductor fabrication equipment is provided to prevent pollution of a bake plate cover due to fumes by purging an N2 gas to an upper exhaust direction. CONSTITUTION: A wafer(12) is loaded on a plate. The first and the second bake plates(14,16) are installed on each upper portion of both sides of the wafer(12). The first and the second bake plate covers(18,20) are installed at each lower portion of the first and the second bake plates(14,16). An exhaust line(22) is installed in a center part of an upper part of the chamber(10). A plurality of holes is formed on the first and the second bake plate covers(18,20) in order to exhaust an N2 gas. The first and the second air curtains(24,26) are installed at both sides of the inside of the chamber(10) in order to implant the N2 gas to each incline plane of the first and the second bake plate covers(18,20).
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