发明名称 MAGNETRON TYPE PARALLEL FLAT PLATE SURFACE TREATING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To increase the density of a plasma in surface treating equipment. SOLUTION: A coaxial magnet set 11 is constituted of a columnar central magnet 11b and a cylindrical peripheral magnet 11c which is arranged so as to have reverse polarity to the magnet 11b. In a counter electrode 2, a large number of the coaxial magnet sets 11 are arranged. Thereby high density plasma is generated uniformly on the periphery of the counter electrode 2, and a magnetic field on a substrate 4 is made almost negligible.
申请公布号 JP2002313784(A) 申请公布日期 2002.10.25
申请号 JP20010114352 申请日期 2001.04.12
申请人 ANELVA CORP 发明人 KOMURA YUKI
分类号 H05H1/46;B01J19/08;C23C16/505;H01L21/205;H01L21/302;H01L21/3065 主分类号 H05H1/46
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