发明名称 EDGE EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide an edge exposure system that can perform good exposure on the edge of a substrate by exposing the edge to the light having a uniform intensity distribution. SOLUTION: The light from a light source unit 31 is made incident to an optical mixing element 34 through a first light guide 33 made of 500 optical fibers. In the optical element 34, the light rays emitted from the optical fibers are mixed (optically mixed) with each other and the light emitted from the light-emitting surface 34a of the element 34 has a nearly uniform intensity distribution. The emitted light having the intensity distribution is introduced to an irradiation head 32 through a second light guide 35 composed of 500 optical fibers and projected upon the edge of the substrate W.
申请公布号 JP2002313708(A) 申请公布日期 2002.10.25
申请号 JP20010118486 申请日期 2001.04.17
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 ONO KAZUYA;KAMEI KENJI
分类号 G03F7/20;H01L21/027;(IPC1-7):H01L21/027 主分类号 G03F7/20
代理机构 代理人
主权项
地址
您可能感兴趣的专利