发明名称 |
METHOD FOR FORMING WIRING, METHOD FOR ARRANGING ELEMENT USING IT AND METHOD FOR MANUFACTURING IMAGE DISPLAY DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To form a via hole easily and to eliminate incomplete conduction by obtaining a good via hole shape. SOLUTION: An insulation layer is formed on a first wiring layer, an opening is made in the insulation layer and then a second insulation layer is formed. When the opening is made, the insulation layer is irradiated with a laser beam while dislocating a focal point. Since the focal point of the laser beam is dislocated, the taper angle of the opening is enlarged and the sidewall has an inclining face and when the wiring layer is formed thereon, the wiring layer also adheres surely onto the sidewall. |
申请公布号 |
JP2002313914(A) |
申请公布日期 |
2002.10.25 |
申请号 |
JP20010120119 |
申请日期 |
2001.04.18 |
申请人 |
SONY CORP |
发明人 |
YANAGISAWA YOSHIYUKI;IWABUCHI TOSHIAKI |
分类号 |
H01L21/28;G09F9/33;H01L21/302;H01L21/48;H01L21/68;H01L21/768;H01L23/31;H01L25/075;H01L33/00;H01L33/20;H01L33/24;H01L33/32;H01L33/38;H01L33/40;H01L33/48;H01L33/54;H01S3/00;H05K3/00 |
主分类号 |
H01L21/28 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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