发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR ULTRAFINE PARTICLE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing semiconductor fine particles industrially advantageously which has high luminous efficiency and a narrow grain distribution. SOLUTION: In the method for manufacturing semiconductor ultrafine particles, a semiconductor crystal is grown in a liquid phase in the presence of an orientational organic phosphide. As the orientational organic phosphide, a heating process is performed in advance, thereby reproducing hypophosphorous acids.
申请公布号 JP2002313746(A) 申请公布日期 2002.10.25
申请号 JP20010119479 申请日期 2001.04.18
申请人 MITSUBISHI CHEMICALS CORP 发明人 SAIDA SOICHIRO
分类号 C01B19/04;H01L21/208;(IPC1-7):H01L21/208 主分类号 C01B19/04
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