发明名称 Positive resist composition
摘要 A positive resist composition comprising a binder resin and a radiation-sensitive compound, wherein the binder resin contains a polymerization unit of the following formula (I) and a polymerization unit of the following formula (II) and becomes alkali-soluble by the radiation-sensitive compound after irradiation with radioactive ray: wherein, R1 and R2 each independently represent a fluoroalkyl group having 1 to 12 carbon atoms and carrying at least one fluorine atom, and R3 represents a hydrogen atom, halogen atom, cyano group, alkyl group having 1 to 3 carbon atoms or a fluoroalkyl group having 1 to 3 carbon atoms and carrying at least one fluorine atom, wherein, R4 represents a group which is cleaved by an acid, and R5 represents a hydrogen atom, halogen atom, cyano group, alkyl group having 1 to 3 carbon atoms or a fluoroalkyl group having 1 to 3 carbon atoms and carrying at least one fluorine atom.
申请公布号 US2002155376(A1) 申请公布日期 2002.10.24
申请号 US20010946556 申请日期 2001.09.06
申请人 HASHIMOTO KAZUHIKO;UETANI YASUNORI;MIYA YOSHIKO 发明人 HASHIMOTO KAZUHIKO;UETANI YASUNORI;MIYA YOSHIKO
分类号 G03F7/004;G03F7/039;(IPC1-7):G03F7/039 主分类号 G03F7/004
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