发明名称 X-RAY ANALYZER BY ELECTRON EXCITATION
摘要 PROBLEM TO BE SOLVED: To provide an X-ray analyzer by electron excitation which achieves an element distribution analysis on uneven samples with a higher accuracy. SOLUTION: In the X-ray analyzer such as EPMA, a sample 6 placed on a sample stage 7 is irradiated with electron beams from an electron gun 1, and characteristic X rays from the surface of the sample are detected to perform an element distribution analysis on the sample. Two sets each of spectral crystals 9 and 9b and X-ray detectors 10a and 10b are arranged at positions facing each other pertaining to electron beams and the intensities of the X rays are detected simultaneously from the sample with the detectors through respective spectral crystals. An additional value and a ratio of intensities are calculated and the additional value is corrected by a correction factor calculated based on the intensity ratio to remove effect due to the unevenness of the sample, thereby achieving the element distribution analysis with a higher accuracy.
申请公布号 JP2002310957(A) 申请公布日期 2002.10.23
申请号 JP20010110763 申请日期 2001.04.10
申请人 JEOL LTD 发明人 OKUMURA TOYOHIKO
分类号 G01N23/225 主分类号 G01N23/225
代理机构 代理人
主权项
地址
您可能感兴趣的专利