POLYCYCLIC COMPOUND HAVING LACTONE STRUCTURE

摘要

PROBLEM TO BE SOLVED: To provide a monomer which gives a polymer suitable as a base resin of a resist material used in photolithography using excimer laser light as a light source. SOLUTION: This monomer is a polycyclic compound represented by formula (1) or (2) (wherein R<1> and R<2> are each H or an alkyl or alkoxycarbonyl group; R<3> and R<4> are each H or an alkyl group; and X is a methylene or ethylene group, O or S).