Method for manufacturing a titanium nitride thin film

摘要

A method of manufacturing a titanium nitride thin film at the surface of a substrate the chemical vapor deposition method (CVD method) includes supplying trakisdialkylamino titanium (TDAAT and ammonia into a reaction vessel, and heating it a prescribed temperature under a low pressure of less than 100 Pa total pressure, wherein the partial pressure PTDAAT of the source-material gas is set in a range of 0<PNH3/PTDAAT<10 with respect to the partial pressure PNH3 of the added ammonia gas.