| 摘要 |
<p>Methods and apparatus for manufacturing a semi-custom integrated circuit by using a standard mask (figure 3, 312) and a custom mask (figure 3, 300) to select from a standardized set of features in a way that obviates the need to create a customized mask containing only the selected features (figure 3, 316), and mask sets created using such methods and apparatus. For some integrated circuit fabrication processes, the second mask has an additional purpose, so it is not created only to perform this selection function. For some fabrication processes, the selection can be achieved without use of additional processing steps.</p> |
