| 摘要 |
<p>An exposure pattern forming method in which a rule-based proximity effect correction to which the computer graphics is applied is used. The exposure pattern forming method for forming an exposure pattern by correcting individual pattern portions constituting a design pattern, by a preset correction corresponding to both the line widths of the individual pattern portions and the space widths of space portions adjoining the individual pattern portions. This method is characterized by comprising processing the design pattern graphically extracting the individual pattern portions every object line width, and extracting the individual space portions every object space width (ST2, ST3); and processing the individual pattern portions extracted every object line width and the individual space portions extracted every object space width graphically on the basis of the individual corrections and correcting the pattern portions of the individual object line widths every object space width (ST4 to ST9).</p> |
