发明名称 |
Verfahren zur Beschichtung mittels MOCVD |
摘要 |
A metal-organic chemical vapor-phase deposition process for fabricating a layer of a Group II-VI compound semiconductor using an organometallic compound based on bis(cyclopentadienyl)magnesium having a vapor pressure in the range of from 1.3 x 10 Pa to 1.3 x 10<2> Pa at a temperature of 330 DEG K. The present invention also provides a light-emitting device which is fabricated by means of the metal-organic vapor-phase deposition process above. The process according to the present invention provides a magnesium-containing compound semiconductor layer having an accurately controlled composition, and it readily enables the fabrication of a compound semiconductor layer having a grated structure. |
申请公布号 |
DE69431365(D1) |
申请公布日期 |
2002.10.17 |
申请号 |
DE1994631365 |
申请日期 |
1994.11.04 |
申请人 |
SONY CORP., TOKIO/TOKYO |
发明人 |
TODA, ATSUSHI;ASANO, TAKEHARU |
分类号 |
C23C16/30;C30B25/02;H01L21/205;H01L21/365;H01L33/00;H01L33/06;H01L33/28;H01L33/30;H01L33/40;H01S5/00 |
主分类号 |
C23C16/30 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|