| 摘要 |
<p>Trap apparatus (10) and method for removing contaminants (142) from the gaseous effluent flows (136) from chemical vapor deposition chambers (20) and processes by flowing the particle laden gas (140) into an upper chamber (90) of the trap apparatus, (10) imparting additional kinetic energy to the powder particles (142) to enhance separation of the powder particles (142) from the gas (140), and then flowing the gas (152), sans the powder particles (142), out of the trap (10), while the powder particles (142) fall into and are captured by a lower chamber (92) positioned below the upper chamber (90) and remote from the flowing gas (152). An impeller (120) positioned in the upper chamber (90) in the inlet path (140) imparts the additional kinetic energy. For some reaction gas systems, an optional reactor with hydrophillic, rotating growth substrates enhance and accelerate growth of solid particles, which are then dislodged from the media, and fed by the flowing gas (148) into the upper chamber (90) for capture as previously described.</p> |
