发明名称 |
Exposure method and apparatus, and device manufacturing method |
摘要 |
This invention provides a scanning exposure apparatus capable of increasing the overlay accuracy. Every time a reticle is exchanged, a direction overlay correction table is updated. A control device for the exposure apparatus corrects the target positions (target locus) of a wafer stage on the basis of the direction overlay correction table.
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申请公布号 |
US2002145716(A1) |
申请公布日期 |
2002.10.10 |
申请号 |
US20020050581 |
申请日期 |
2002.01.18 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KUROSAWA HIROSHI |
分类号 |
G03F7/22;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):G03B27/52 |
主分类号 |
G03F7/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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