发明名称 |
Megazone system |
摘要 |
A process tank and method for stripping photoresist from semiconductor wafers. In one aspect, the invention is a method for processing integrated circuits comprising: placing at least one wafer having an edge in a process tank having a lid; closing the lid; filling the process tank with a process liquid to a predetermined level below the edge of the wafer; and applying acoustical energy to the process liquid so as to form a mist of process liquid in the process tank. In another aspect the invention is a process tank having a process chamber comprising: a means to support at least one wafer in the processing chamber; means for filling the chamber with a process liquid; a lid adapted to close the chamber; a liquid level sensor adapted to stop the supply of process liquid to the chamber when the process liquid fills the chamber to a predetermined level below a wafer supported in the processing chamber; and an acoustical energy source adapted to supply acoustical energy to process liquid located in the chamber so as to create a mist of the process liquid in the processing chamber.
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申请公布号 |
US2002144708(A1) |
申请公布日期 |
2002.10.10 |
申请号 |
US20020117768 |
申请日期 |
2002.04.05 |
申请人 |
KASHKOUSH ISMAIL;NOVAK RICHARD;NEMETH DENNIS;CHEN GIM-SYANG |
发明人 |
KASHKOUSH ISMAIL;NOVAK RICHARD;NEMETH DENNIS;CHEN GIM-SYANG |
分类号 |
H01L21/027;B08B3/02;B08B7/00;H01L21/00;H01L21/304;(IPC1-7):B08B3/12 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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