| 摘要 |
An installation for processing wafers with a plurality of fabrication units and a plurality of measurement units as well as a transport system for transporting the wafers, is described. A transport control unit, which detects a capacity utilization of the installation and saves a processing sequence of the wafers, is allocated to the transport system. As a function of these parameters, control instructions are generated in the transport control unit, and can be output to the transport system for controlling the wafer transport procedure.
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