发明名称 METHOD FOR APPLYING ANTISTAINING TREATMENT TO SURFACE OF MATTER AND MATTER SUBJECTED TO ANTISTAINING TREATMENT
摘要 PROBLEM TO BE SOLVED: To provide a method for applying antistaining treatment to the surface of the functional layer formed on the surface of matter lacking in flexibility like a panel material by transfer and the matter subjected to antistaining treatment. SOLUTION: In the method for applying antistaining treatment to the surface of the functional layer 2 formed on the surface of the matter 4 by transfer, the surface of the functional layer 2 to be subjected to antistaining treatment is coated with an antistaining agent coating solution containing a compound having at least a perfluoroalkyl group. The coated antistaining agent is subjected to fixing treatment and the unfixed excess antistaining agent is removed to form an antistaining treatment layer 5. Hydrophilizing treatment is preferably applied to the surface of the functional layer 2 to be preliminarily subjected to antistaining treatment. The compound is preferably a silicon compound having a hydrolyzable group other than the perfluoroalkyl group. As the functional layer, there are a reflection preventing layer, an anti-glare layer and a hard coat layer.
申请公布号 JP2002292776(A) 申请公布日期 2002.10.09
申请号 JP20010093711 申请日期 2001.03.28
申请人 TDK CORP 发明人 ITO HIDETAKA;IIJIMA TADAYOSHI;YAMAUCHI TAKAHIRO
分类号 G02B1/10;B32B7/02;B32B27/00;G02B1/11;G09F9/00 主分类号 G02B1/10
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