发明名称 SENSOR UTILIZING TOTAL REFLECTION ATTENUATION
摘要 <p>PROBLEM TO BE SOLVED: To perform precise measurement in measuring with a sensor utilizing total reflection attenuation. SOLUTION: The sensor utilizing total reflection attenuation is provided with a dielectric block 10, a thin film layer 12 formed on its one face, an optical system 15 impinging a light beam 13 onto the dielectric block 10 at various angles so as to obtain total reflection condition at an interface 10b between the dielectric block 10 and the thin film layer 12, and an array-like photodiode array 17 which detects the light beam totally reflected from the interface 10b. A light source generating a light beam at wavelength of 950 nm is used, and the measurement is performed using this light beam at wavelength of 950 nm.</p>
申请公布号 JP2002296176(A) 申请公布日期 2002.10.09
申请号 JP20010286616 申请日期 2001.09.20
申请人 FUJI PHOTO FILM CO LTD 发明人 MUKAI ATSUSHI;FUKUNAGA TOSHIAKI
分类号 G01N21/27;(IPC1-7):G01N21/27 主分类号 G01N21/27
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