发明名称 Patterning method
摘要 A patterning method comprises selectively depositing droplets of a first polymer material solvent solution onto a layer of another polymer material. The solvent is chosen to dissolve both polymer materials, which are selected so as to exhibit phase separation upon drying to provide domains of the first polymer material embedded in and extending though ther other polymer material. By selection of appropriate polymer materials the patterning method may be used, for example, to fabricate light emitting devices, optical colour filters, or vertical interconnects in electronic devices.
申请公布号 GB2374202(A) 申请公布日期 2002.10.09
申请号 GB20010008347 申请日期 2001.04.03
申请人 * SEIKO EPSON CORPORATION 发明人 TAKEO * KAWASE
分类号 H05B33/10;G09F9/00;G09F9/30;H01L27/32;H01L51/00;H01L51/05;H01L51/30;H01L51/40;H01L51/50;H05B33/02;H05B33/12;H05B33/22;H05B33/26 主分类号 H05B33/10
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