发明名称 |
PLASMA REACTOR AND PLASMA REACTION METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a plasma reactor and a plasma reaction method which enables treatment based on stabilized reaction when a gas is made into plasma and the continuous treatment utilizing the energy of the plasma is performed. SOLUTION: This plasma reactor and plasma reaction method has such a constitution that electrodes of high potential side and low potential side are arranged in the reactor, inorganic dielectric material having a structure which allows the gas to flow between the electrodes is charged, the discharge is generated between the electrodes and the gas which exists between the electrodes is made plasma and is constituted so as to enable temperature control in the reactor. |
申请公布号 |
JP2002292273(A) |
申请公布日期 |
2002.10.08 |
申请号 |
JP20010103738 |
申请日期 |
2001.04.02 |
申请人 |
CANON INC |
发明人 |
AOYANAGI HIROMI;NISHIGUCHI TOSHIMOTO;TAMURA JUNICHI |
分类号 |
H05H1/24;B01J19/08;C07B61/00;H01J37/32 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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