SUBSTRATE DRYING APPARATUS AND SUBSTRATE DRYING METHOD

摘要

PURPOSE: A substrate drying apparatus is provided to unnecessarily exhaust treatment liquid during a standby time of a dry process such that the treatment liquid is vapor of the treatment liquid coagulated and stored in a container for receiving the water eliminated from an object to be treated. CONSTITUTION: A process bath(14) has the object to be treated. A treatment liquid containing region contains a volatile treatment liquid(16). A heating member evaporates the treatment liquid. A receiving container(10) receives water removed from the object with use of the evaporated treatment liquid, provided below the object containing region. An exhaust pipe(42) exhausts the water from the container to the outside of the process bath, attached to the container. A cooling device condenses the evaporated treatment liquid, provided above the object containing region of the process bath. The exhaust pipe has a valve and a branch pipe branched from the exhaust pipe such that the branch pipe is closer to the container than the valve is.