METHOD OF GROWING CALCIUM-SILICIDE THIN FILM

摘要

PROBLEM TO BE SOLVED: To provide a method of growing a thin film of single-phase calcium silicide(Ca2 Si), in which a mole ratio of Ca:Si is 2:1, on a silicon substrate via a magnesium-silicide thin film. SOLUTION: The silicon substrate on which the magnesium-silicide thin film is formed is exposed to a calcium vapor atmosphere in a closed space to cause substitution reaction between magnesium atoms and calcium atoms of the magnesium-silicide thin film, and thus growing the calcium-silicide thin film on the surface of the magnesium-silicide thin film.