APPARATUS AND METHOD FOR COLLECTING POLLUTANTS OF SEMICONDUCTOR WAFER

摘要

PURPOSE: An apparatus and a method for collecting pollutants of a semiconductor wafer are provided to collect a pollution source from a surface of a wafer by scanning automatically a surface of a semiconductor wafer. CONSTITUTION: A process chamber(100) has a shape of rectangular parallelepiped. A transfer unit(700) is used for transferring a wafer(50) of a loader portion(200) to a vapor phase deposition unit(300), a scanning unit(400), a dry unit(500), and an unloader portion(600). The loader portion(200) and the unloader portion(600) are installed at one side and the other side of the process chamber(100), respectively. The loader portion(200) and the unloader portion(600) have wafer cassettes for loading wafers(50). The vapor phase deposition unit(300) is formed with a loading plate(350), an airtight container(310), and a hydrofluoric acid tank. The scanning unit(400) is installed between the vapor phase deposition unit(300) and the unloader portion(600).