| 发明名称 |
PHOTORESIST COMPOSITION |
| 摘要 |
Disclosed are photoresist compositions suitable for imaging with sub 200 nm wavelength radiation including ether linkages containing certain leaving groups. Also disclosed are methods of providign photoresist relief images using the photoresist compositions. |
| 申请公布号 |
WO02077712(A2) |
申请公布日期 |
2002.10.03 |
| 申请号 |
WO2002US07938 |
申请日期 |
2002.03.15 |
| 申请人 |
SHIPLEY COMPANY, L.L.C. |
发明人 |
SZMANDA, CHARLES, R.;TAYLOR, GARY, N. |
| 分类号 |
C08F232/08;G03F7/004;G03F7/033;G03F7/039;G03F7/11;H01L21/027 |
主分类号 |
C08F232/08 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
