发明名称 APPARATUS AND METHOD FOR MEASUREMENT OF X-RAY REFLECTANCE
摘要 <p>PROBLEM TO BE SOLVED: To efficiently measure an X-ray reflectance over a wide region on the surface of a sample. SOLUTION: In the X-ray reflectance measuring apparatus, line focus X-rays 2a radiated from an X-ray source 10 are made monochromatic via a monochromator 20 so as to be shone at the surface 3a of the sample, and X-rays 2c reflected by the surface 3a of the sample 3 are detected. An asymmetric reflecting member 30 which reflects X-rays 2b at an asymmetric angle with reference to the angle of incidence of the X-rays 2a is arranged on an X-ray optical path between the monochromator 30 and the sample 3. The angle of the surface 31 of the member 30 to a crystal grating face 32 is set in such a way that the angle of reflection of the X-rays 2b with reference to the surface 31 of the member 30 becomes larger than the angle of incidence of the X-rays 2a. By the member 30, the X-rays 2a which are expanded in the longitudinal direction are taken out so as to be shone at the surface 3a of the sample 3.</p>
申请公布号 JP2002286658(A) 申请公布日期 2002.10.03
申请号 JP20010094136 申请日期 2001.03.28
申请人 RIGAKU CORP 发明人 KAWATO SEIJI
分类号 G01N23/20;(IPC1-7):G01N23/20 主分类号 G01N23/20
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