| 摘要 |
PROBLEM TO BE SOLVED: To introduce uniformly dispersed pores or voids into an insulation film so as to reduce the dielectric constant of an intermediate layer, an intermetal or an insulator of an electronic device in the production of electronic parts and to reduce an active ray reflection in exposure of photoresist. SOLUTION: This composition is useful for forming a porous organo polysilica dielectric substance and contains a removable porogen which comprises one or more chromophoric groups. The one or more chromophoric groups are selected from monomers containing phenyl, substituted phenyl, naphthyl, substituted naphthyl, anthracenyl, substituted anthracenyl, phenanthrenyl, substituted phenanthrenyl and one or more (4C-24C) alkyl groups. |
