发明名称 |
METHOD FOR PRODUCING COMPOSITE MEMBER, PHOTOSENSITIVE COMPOSITION AND POROUS BASE MATERIAL |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a composite member in which a wiring pattern is formed on a base material of an insulator by which a fine three-dimensional pattern can be formed at a low cost without dissolving and peeling a photosensitive layer by a plating solution. SOLUTION: The method is provided with (1) a stage where a photosensitive layer containing a photosensitive compound which produces or loses an ion exchangeable group by the irradiation of an energy ray and a crosslinkable compound having a crosslinkable group is formed on an insulator; (2) a stage where the photosensitive layer is pattern-exposed, and on the exposed part, the ion-exchangeable group is produced or lost to form a pattern of the ion exchangeable group; (3) a stage where the crosslinkable compound of the photosensitive layer at least in the exposed part is crosslinked; (4) a stage where a metallic ion or a metallic colloid is adsorbed on the pattern of the ion- exchangeable group formed by the above pattern exposure; and (5) a stage where the pattern of the ion-exchangeable group with the metallic ion or metallic colloid adsorbed is subjected to electroless plating to form an electrically conductive pattern. |
申请公布号 |
JP2002285342(A) |
申请公布日期 |
2002.10.03 |
申请号 |
JP20010092715 |
申请日期 |
2001.03.28 |
申请人 |
TOSHIBA CORP |
发明人 |
HIRAOKA TOSHIRO;HOTTA YASUYUKI;ASAKAWA KOUJI;MATAKE SHIGERU |
分类号 |
C23C18/20;H05K3/18;H05K3/46;(IPC1-7):C23C18/20 |
主分类号 |
C23C18/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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