发明名称 POWER SUPPLY FOR PROCESSING OF GASEOUS MEDIA
摘要 A reactor (1) particularly for the plasma treatment of internal combustion engine exhaust gases, in which a power supply (10) and a reactor bed (2) of the dielectric barrier discharge type are connected directly and enclosed in an earthed metal chamber (17) which both isolates the high voltage power supply and acts as a Faraday cage preventing the emission of electromagnetic radiation from the power supply or plasma.
申请公布号 WO0043645(A3) 申请公布日期 2002.10.03
申请号 WO2000GB00108 申请日期 2000.01.18
申请人 ACCENTUS PLC;HALL, STEPHEN, IVOR;INMAN, MICHAEL;MARTIN, ANTHONY, ROBERT;RAYBONE, DAVID;WEEKS, DAVID, MICHAEL;SEGAL, DAVID, LESLIE 发明人 HALL, STEPHEN, IVOR;INMAN, MICHAEL;MARTIN, ANTHONY, ROBERT;RAYBONE, DAVID;WEEKS, DAVID, MICHAEL;SEGAL, DAVID, LESLIE
分类号 F01N3/02;B01D53/32;B01D53/56;B01D53/74;B01D53/92;B01J19/08;F01N3/08;F01N3/24;F23G7/06;(IPC1-7):F01N3/08 主分类号 F01N3/02
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