| 发明名称 |
Projection optical system and projection exposure apparatus with the same, and device manufacturing method |
| 摘要 |
A projection optical system for projecting a pattern of a mask onto a wafer, includes at least one aspherical surface lens having an aspherical surface on one side and a flat surface on the other side, the spherical surface satisfying a relation |DELTAASPH/L|>1x10-6 where DELTAASPH is the aspherical amount of the aspherical surface and L is an object-to-image distance of the projection optical system.
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| 申请公布号 |
US6459534(B1) |
申请公布日期 |
2002.10.01 |
| 申请号 |
US20000591218 |
申请日期 |
2000.06.12 |
| 申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KATO TAKASHI;TERASAWA CHIAKI;ISHII HIROYUKI |
| 分类号 |
G02B13/24;G02B13/14;G02B13/18;G03F7/20;H01L21/027;(IPC1-7):G02B3/00 |
主分类号 |
G02B13/24 |
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