发明名称 |
PATTERN DEFECT CORRECTING DEVICE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a pattern defect correcting device which can be used effectively for a correction object having a large variety of pattern shapes like a photomask used in a manufacturing process of a shadow mask. SOLUTION: The pattern defect correcting device which exposes laser beam at a regulated exposure band to correct defects in a pattern, regulates exposure band in rectangle shape, and is equipped with a rectangle opening means to vary sizes of an X side and Y side and rotating angles of the rectangle, a circular opening means to regulate the exposure band in a circular shape, and a switching means to switch between the rectangle opening means and the circular opening means to apply for the regulation of the exposure band.</p> |
申请公布号 |
JP2002279899(A) |
申请公布日期 |
2002.09.27 |
申请号 |
JP20010077549 |
申请日期 |
2001.03.19 |
申请人 |
DAINIPPON PRINTING CO LTD |
发明人 |
WATANABE TAKAFUMI;UEHARA NOBORU;SUZUKI KENSAKU |
分类号 |
G03F1/72;H01J9/14;H01J9/50;H01L21/027;H02J7/00;(IPC1-7):H01J9/50;G03F1/08 |
主分类号 |
G03F1/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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