发明名称 |
Combined plasma/liquid cleaning of substrates |
摘要 |
Apparatus and method for cleaning substrates. A substrate is held and rotated by a chuck and an atmospheric pressure plasma jet places a plasma onto predetermined areas of the substrate. Subsequently liquid rinse is sprayed onto the predetermined areas. In one embodiment, a nozzle sprays a gas onto the predetermined areas to assist in drying the predetermined areas when needed.
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申请公布号 |
US2002134403(A1) |
申请公布日期 |
2002.09.26 |
申请号 |
US20010803065 |
申请日期 |
2001.03.12 |
申请人 |
SELWYN GARY S.;HENINS IVARS |
发明人 |
SELWYN GARY S.;HENINS IVARS |
分类号 |
H05H1/24;B08B3/02;B08B7/00;H01L21/00;H01L21/304;(IPC1-7):B08B3/02;B08B7/04 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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