| 发明名称 |
Apparatus and method for electro chemical deposition |
| 摘要 |
A system is provided in which a smaller flow of deposition solution is diverted from a larger flow of deposition solution flowing on an electro-chemical deposition tool platform. The smaller flow is diverted to a dosing unit which may be on a separate platform. The dosing unit in one embodiment comprises a pressurized flow line.
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| 申请公布号 |
US6454927(B1) |
申请公布日期 |
2002.09.24 |
| 申请号 |
US20000603791 |
申请日期 |
2000.06.26 |
| 申请人 |
APPLIED MATERIALS, INC. |
发明人 |
STEVENS JOSEPH J.;RABINOVICH YEVGENIY;CHAO SANDY S.;DENOME MARK R.;D'AMBRA ALLEN L.;OLGADO DONALD J. |
| 分类号 |
C25D17/00;C25D7/12;C25D21/14;C25D21/18;H01L21/288;(IPC1-7):C25B15/00 |
主分类号 |
C25D17/00 |
| 代理机构 |
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