发明名称 OPTICAL BEAM GUIDE SYSTEM AND METHOD OF PREVENTING CONTAMINATION OF OPTICAL COMPONENTS CONTAINED IN SYSTEM
摘要 <p>PROBLEM TO BE SOLVED: To prevent or at least reduce influences of contaminants in optical components of a beam guide system acting with use of UV in a novel and advantageous manner, without affecting the operation and/or beam guide quality of the beam guide system. SOLUTION: A method of reducing contamination of at least one optical component is contained in a beam guide space and held with a frame bounding the beam guide space and to an optical beam guide system. The surface of the frame defining the beam guide space is at least partly covered preferably with a degassed barrier layer not increasing the reflectivity. The method is utilizable e.g. in a lithography irradiation system acting with use of UV.</p>
申请公布号 JP2002270502(A) 申请公布日期 2002.09.20
申请号 JP20020028953 申请日期 2002.02.06
申请人 CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG 发明人 FREITAG ANSGAR;BINGEL ULRICH;DISTL JOSEF;HAMM UWE W
分类号 H01L21/027;G02B7/02;G02B27/00;G03F7/20;(IPC1-7):H01L21/027 主分类号 H01L21/027
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