发明名称 |
OPTICAL BEAM GUIDE SYSTEM AND METHOD OF PREVENTING CONTAMINATION OF OPTICAL COMPONENTS CONTAINED IN SYSTEM |
摘要 |
<p>PROBLEM TO BE SOLVED: To prevent or at least reduce influences of contaminants in optical components of a beam guide system acting with use of UV in a novel and advantageous manner, without affecting the operation and/or beam guide quality of the beam guide system. SOLUTION: A method of reducing contamination of at least one optical component is contained in a beam guide space and held with a frame bounding the beam guide space and to an optical beam guide system. The surface of the frame defining the beam guide space is at least partly covered preferably with a degassed barrier layer not increasing the reflectivity. The method is utilizable e.g. in a lithography irradiation system acting with use of UV.</p> |
申请公布号 |
JP2002270502(A) |
申请公布日期 |
2002.09.20 |
申请号 |
JP20020028953 |
申请日期 |
2002.02.06 |
申请人 |
CARL ZEISS SEMICONDUCTOR MANUFACTURING TECHNOLOGIES AG |
发明人 |
FREITAG ANSGAR;BINGEL ULRICH;DISTL JOSEF;HAMM UWE W |
分类号 |
H01L21/027;G02B7/02;G02B27/00;G03F7/20;(IPC1-7):H01L21/027 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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