| 摘要 |
PROBLEM TO BE SOLVED: To provide a wafer treatment device in which operatability of maintenance of a filter for filtering a treatment solvent. SOLUTION: This wafer treatment device is equipped with a filter 9 for filtering a treatment solvent to be allowed to act on a wafer W or a treatment solvent allowed to act on a wafer W, and performs surface treatment of the wafer W by allowing the treatment solvent to act on the wafer W. This device includes a housing 11 for housing the filter 9 at a predetermined housing position inside thereof, an exclusively used case 12 attached to the filter 9 and a fitting mechanism 13 for fitting the filter 9 to which this case 12 is attached so that the filter is attached to the predetermined housing position in the housing 11 via this case 12.
|
