发明名称 Semiconductor memory device
摘要 Each of MIS transistors of a semiconductor memory device has a semiconductor layer (12); a source region (15) formed in the semiconductor layer; a drain region (14) formed apart from the source region in the semiconductor layer, the semiconductor layer between the source region and the drain region serving as a channel body in a floating state; a first gate (13) which forms a channel in the channel body; a second gate (20) formed so as to control a potential of the channel body by a capacitive coupling; and a high concentration region (21) formed in the channel body on the second gate side, impurity concentration of the high concentration region being higher than that of the channel body.
申请公布号 US2002130341(A1) 申请公布日期 2002.09.19
申请号 US20010005180 申请日期 2001.12.03
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 HORIGUCHI FUMIO;OHSAWA TAKASHI;IWATA YOSHIHISA;YAMADA TAKASHI
分类号 H01L27/108;H01L27/12;(IPC1-7):H01L31/119 主分类号 H01L27/108
代理机构 代理人
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