发明名称 Semiconductor device
摘要 There is provided a semiconductor device including a transistor formed by means of a common contact hole that connects a gate electrode, and a diffused layer forming a source/drain terminal; and a semiconductor device comprising the gate electrode of the transistor, and a connecting terminal to which capacitance between substrates and capacitance between the gate electrode and the source/drain terminal are added, thereby improving the soft error resistance caused by alpha rays and neutron beams.
申请公布号 US2002130344(A1) 申请公布日期 2002.09.19
申请号 US20010003404 申请日期 2001.12.06
申请人 NII KOJI;IGARASHI MOTOSHIGE 发明人 NII KOJI;IGARASHI MOTOSHIGE
分类号 H01L29/78;G11C11/412;H01L21/3205;H01L21/768;H01L21/8234;H01L21/8244;H01L27/088;H01L27/10;H01L27/11;(IPC1-7):H01L29/76;H01L29/94;H01L31/062;H01L27/108 主分类号 H01L29/78
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