POLISHING PAD

摘要

PROBLEM TO BE SOLVED: To provide a polishing pad started with a short start-up time in polishing, capable of providing a high-flatness and high-quality product. SOLUTION: In this polishing pad with a honeycomb-like porous layer 3, a skin layer 2 of the porous layer 3 is partially removed such that a skin layer removal ratio per unit area becomes 3-75%.