发明名称 |
WATER-PROCESSABLE PHOTORESIST COMPOSITIONS |
摘要 |
Water-processable positive-tone photoresists comprising a water-soluble polymer, wherein the polymer contains a heat-labile functional group that renders the polymer insoluble in water or an aqueous base upon heat treatment, and an acid-labile functional group that restores said water or aqueous base solubility to the polymer upon irradiation in the presence of a water-processable photoacid generator, are described. Also described are the methods of making such polymers and photoresists. |
申请公布号 |
EP1240552(A1) |
申请公布日期 |
2002.09.18 |
申请号 |
EP20000955540 |
申请日期 |
2000.08.14 |
申请人 |
BOARD OF REGENTS |
发明人 |
YAMADA, SHINTARO;RAGER, TIMO;WILLSON, C., GRANT |
分类号 |
G03F7/039;C08F8/00;C08F212/14;G03F7/004;G03F7/033;G03F7/038;G03F7/16;H01L21/027 |
主分类号 |
G03F7/039 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|