| 摘要 |
<p>Process for increasing the yield of photochemical reactns., particularly in the continuous photo oximation of cycloalkanes in which nitrosyl chloride (prepd. in situ in a sulphuric acid phase) and a liquid cycloalkane are subjected to rays from an emitter, the walls of which are immersed in the reaction medium. The min. temp. of the wall transmitting the luminous energy is dependent on the oxime concn. in the sulphuric acid phase, and the proportion (by wt.) of sulphuric acid in the reactn. medium, and is controlled by a circulating fluid. By this process, the temps. of the emitter wall are controlled so that any viscous layer which could foul this wall is rendered sufficiently fluid so that it does not adhere.</p> |
