| 发明名称 |
Improved flourine doped sio2 film |
| 摘要 |
The present invention is a dielectric film and its method of fabrication. The dielectric film of the present invention includes silicon oxygen fluorine and nitrogen wherein the interlayer dielectric comprises between 0.01 - 01 atomic percent nitrogen. |
| 申请公布号 |
GB2373372(A) |
申请公布日期 |
2002.09.18 |
| 申请号 |
GB20020012404 |
申请日期 |
2000.10.11 |
| 申请人 |
* INTEL CORPORATION |
发明人 |
CHI-HING * CHOI;JOHN * BUMGARNER;TODD * WILKE;MELTON * BOST |
| 分类号 |
C23C16/30;H01L21/316;H01L23/532;(IPC1-7):H01L23/532 |
主分类号 |
C23C16/30 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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