发明名称 PLASMA PROCESSING METHOD AND PLASMA PROCESSOR USING MARX CIRCUIT
摘要 PROBLEM TO BE SOLVED: To provide a compact plasma processor at a low cost by which the pulse voltage of a high voltage/a high frequency is generated in a pulse generation circuit by a low input voltage. SOLUTION: In this plasma processor, a 2-stage type Marx circuit composed by connecting first and second impulse circuits C1 and C2 in multistages is used as the pulse generation circuit C. In the pulse generation circuit C, the pulse voltage generated by the first impulse circuit C1 and the pulse voltage generated by the second impulse circuit C2 are synchronously superimposed and the pulse voltage which is the double (pulse height value) of the pulse voltage generated by the first impulse circuit C1 is generated. Thus, the input voltage of the respective impulse circuits C1 and C2, that is the input voltage of the pulse generation circuit C, is reduced to about 1/2 of a conventional case, the cost of the plasma processor is lowered and it is compacted.
申请公布号 JP2002263471(A) 申请公布日期 2002.09.17
申请号 JP20010061907 申请日期 2001.03.06
申请人 NIPPON PAINT CO LTD 发明人 AKUTSU KENSUKE;UEKI KOJI
分类号 H05H1/36;B01J19/00;B01J19/08;C08J7/00;H05H1/46 主分类号 H05H1/36
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