| 摘要 |
An improved double chamber ion source (48) comprising a plasma generating chamber (50), a charge exchange chamber (52) and a divider structure (56) therebetween. The charge exchange chamber (52) includes magnetic shielding material (66) to reduce exposure of interior components to magnetic field lines externally generated. The double compartment ion source (48) further comprises inclusion of a heat shield (72) and/or a cooling system (76) to overcome deleterious effects caused by increased temperature in the plasma generating chamber (50). The divider structure (56) has a plurality of apertures (58) having a configuration (82, 84) to reduce surface area on the divider structure (56) in the charge exchange chamber (52). |
