DIAMOND COATINGS ON REACTOR WALL AND METHOD OF MANUFACTURING THEREOF
摘要
A corrosion resistant component of semiconductor processing equipment such as a plasma chamber includes a diamond containing surface and process for manufacture thereof. The equipment may be a plasma etching chamber.
申请公布号
WO02054454(A3)
申请公布日期
2002.09.12
申请号
WO2001US43153
申请日期
2001.11.21
申请人
LAM RESEARCH CORPORATION;O'DONNELL, ROBERT, J.;DAUGHERTY, JOHN, E.;CHANG, CHRISTOPHER, C.
发明人
O'DONNELL, ROBERT, J.;DAUGHERTY, JOHN, E.;CHANG, CHRISTOPHER, C.
