发明名称 |
Overlay key, method of manufacturing the same and method of measuring an overlay degree using the same |
摘要 |
An overlay key includes a first overlay key having a first main overlay pattern and a first auxiliary pattern, and a second overlay key having a second main overlay pattern and a second auxiliary overlay pattern, the second auxiliary overlay pattern formed at a location corresponding to the first auxiliary overlay pattern. |
申请公布号 |
US2002127483(A1) |
申请公布日期 |
2002.09.12 |
申请号 |
US20020043329 |
申请日期 |
2002.01.14 |
申请人 |
BAEK KYOUNG-YOON;BAE YOUNG-GUK |
发明人 |
BAEK KYOUNG-YOON;BAE YOUNG-GUK |
分类号 |
G03F1/08;G03F1/42;G03F7/20;G03F9/00;H01L21/027;H01L21/66;H01L23/544;(IPC1-7):G03F9/00;G03C5/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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