发明名称 METHOD FOR LOADING WAFER IN SEMICONDUCTOR FABRICATION PROCESS
摘要 PURPOSE: A method for loading a wafer in a semiconductor fabrication process is provided to enhance productivity by reducing a time for transferring a wafer. CONSTITUTION: A wafer cassette(130) is loaded in the second load lock chamber(114) adjacent to a process chamber(120). The second load lock chamber(114) is located at the nearest place from the load lock chamber(120). The wafer cassette is loaded in the third load lock chamber(116) and the first load lock chamber(112), sequentially. A wafer transfer process is performed by transferring the wafer of the wafer cassette loaded in the second load lock chamber(114). Accordingly, a processing time can be reduced by transferring the second load lock chamber(114) located at the nearest place from the load lock chamber(120).
申请公布号 KR20020071165(A) 申请公布日期 2002.09.12
申请号 KR20010011138 申请日期 2001.03.05
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM, HYO JIN;MUN, GYEONG TAE;OH, HYEONG WON;PARK, HEUNG U
分类号 H01L21/68;(IPC1-7):H01L21/68 主分类号 H01L21/68
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