ARC EVAPORATION SOURCE, FIRING METHOD THEREFOR, AND METHOD FOR CONTROLLING REFLECTANCE OF VAPOR DEPOSITED FILM THEREWITH

摘要

PROBLEM TO BE SOLVED: To provide an arc evaporation source which is advantageous for miniaturizing a vacuum chamber. SOLUTION: This arc evaporation source comprises a tubular anode 3 arranged in a chamber 5 of which the inside can be made substantially vacuum, a columnar cathode 2 consisting of a material for forming a vapor deposition film, which can be inserted into the bore of the anode 3, and a feeding means 4 for feeding the cathode into the bore of the anode 3 by moving the cathode 2 along the axis of the cathode.