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发明名称
MODIFICATION OF 193 NM SENSITIVE PHOTORESIST MATERIALS BY ELECTRON BEAM EXPOSURE
摘要
申请公布号
EP1238314(A1)
申请公布日期
2002.09.11
申请号
EP20000936502
申请日期
2000.06.09
申请人
ELECTRON VISION CORPORATION
发明人
ROSS, MATTHEW;WONG, SELMER
分类号
G03F7/039;G03F7/09;G03F7/40;H01L21/027;(IPC1-7):G03F7/40;G03F7/004
主分类号
G03F7/039
代理机构
代理人
主权项
地址
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